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Home > News > Chemicals

Toray sets to commercialize award-winning advanced photosensitive PI patterning technology

Source：Adsale Plastics Network Date ：2026-03-25 Editor ：RC
Copyright： This article was originally written/edited by Adsale Plastics Network (AdsaleCPRJ.com), republishing and excerpting are not allowed without permission. For any copyright infringement, we will pursue legal liability in accordance with the law.

Toray Industries is poised to begin mass-producing its STF-1000 photosensitive polyimide solution based on the proprietary negative-type photosensitive technology.

 

The technology delivers patterning with an aspect ratio of 36 for films up to 500 micrometers thick. High-aspect-ratio patterning technology forms microstructures that are narrow and tall.


Toray_photosensitive PI patterning tech.jpg

Toray’s negative-type photosensitive technology delivers patterning with an aspect ratio of 36 for films up to 500 micrometers thick.

 

The company began shipping samples to customers last year for evaluations across electronic components, micro-electromechanical systems (MEMS) and diverse other applications. MEMS technology integrates micro-mechanical components, sensors, actuators, and other elements using microfabrication techniques developed for semiconductor devices.

 

More on the technology

 

Toray’s polymer design technology for negative-tone formulation photosensitive materials. It created a photosensitive polyimide that can suppress pattern distortion and cracking even in thick films, culminating in an aspect ratio of 36 in films thicker than 200 micrometers. This material made it possible to form diverse patterns, including semiconductor vias and MEMS structures.

 

The material also serves in scintillator panels in X-ray non-destructive testing equipment. Diverse prospective applications include advanced semiconductors and microfluidic devices. A scintillator panel is an X-ray imaging device component that emits visible light when X-rays strike it.

 

In 2025, Toray developed STF-2000, a photosensitive polyimide free of per- and polyfluoroalkyl substances, and has explored applications principally for electronic components and microfluidic devices.

 

Award-winning technology

 

Toray earned The Chemical Society of Japan Award for Young Chemists in Technical Development for 2025 for developing this high-aspect-ratio patterning technology while retaining the inherent advantages of a polyimide structure. These include excellent resistance to heat and chemicals, mechanical strength, insulation, and ultraviolet ray durability.

 

 


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Source：Adsale Plastics Network Date ：2026-03-25 Editor ：RC
Copyright： This article was originally written/edited by Adsale Plastics Network (AdsaleCPRJ.com), republishing and excerpting are not allowed without permission. For any copyright infringement, we will pursue legal liability in accordance with the law.

Toray Industries is poised to begin mass-producing its STF-1000 photosensitive polyimide solution based on the proprietary negative-type photosensitive technology.

 

The technology delivers patterning with an aspect ratio of 36 for films up to 500 micrometers thick. High-aspect-ratio patterning technology forms microstructures that are narrow and tall.


Toray_photosensitive PI patterning tech.jpg

Toray’s negative-type photosensitive technology delivers patterning with an aspect ratio of 36 for films up to 500 micrometers thick.

 

The company began shipping samples to customers last year for evaluations across electronic components, micro-electromechanical systems (MEMS) and diverse other applications. MEMS technology integrates micro-mechanical components, sensors, actuators, and other elements using microfabrication techniques developed for semiconductor devices.

 

More on the technology

 

Toray’s polymer design technology for negative-tone formulation photosensitive materials. It created a photosensitive polyimide that can suppress pattern distortion and cracking even in thick films, culminating in an aspect ratio of 36 in films thicker than 200 micrometers. This material made it possible to form diverse patterns, including semiconductor vias and MEMS structures.

 

The material also serves in scintillator panels in X-ray non-destructive testing equipment. Diverse prospective applications include advanced semiconductors and microfluidic devices. A scintillator panel is an X-ray imaging device component that emits visible light when X-rays strike it.

 

In 2025, Toray developed STF-2000, a photosensitive polyimide free of per- and polyfluoroalkyl substances, and has explored applications principally for electronic components and microfluidic devices.

 

Award-winning technology

 

Toray earned The Chemical Society of Japan Award for Young Chemists in Technical Development for 2025 for developing this high-aspect-ratio patterning technology while retaining the inherent advantages of a polyimide structure. These include excellent resistance to heat and chemicals, mechanical strength, insulation, and ultraviolet ray durability.

 

 


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Toray sets to commercialize award-winning advanced photosensitive PI patterning technology

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